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- Copyright
- Copyright Copyright (c) 2007 The Japan Society of Applied Physics
- ISSN
- 0021-4922
- eISSN
- 1347-4065
- DOI
- 10.1143/JJAP.46.L568
- Publisher site
- See Article on Publisher Site
Abstract
The performance of a newly developed high-resolution 300 kV microscope equipped with a spherical aberration corrector for probe-forming systems is reported. This microscope gave the highest resolution for the distance between atomic columns, as determined by a high-angle annular dark field imaging method using a GaN[211] crystalline specimen, where the distance between the neighboring columns of Ga was 63 pm.
Journal
Japanese Journal of Applied Physics – IOP Publishing
Published: Jun 1, 2007