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Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films CrossRef

Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

Elam, Jeffrey W.; Baker, David A.; Hryn, Alexander J.; Martinson, Alex B. F.; Pellin, Michael J.; Hupp, Joseph T.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 26 (2): 244-252 – Mar 1, 2008
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Publisher
CrossRef
ISSN
0734-2101
DOI
10.1116/1.2835087
Publisher site
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Abstract

Journal

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films – CrossRef

Published: Mar 1, 2008

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