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The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel... Highly oriented crystalline films of copper sulfide and copper selenide have been grown on glass by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) and by aerosol-assisted chemical vapor deposition (AACVD), using the novel air-stable compounds Cu(E2CNMenHex)2]* (where E=S,Se). Thin films of non-stoichiometric cubic CuS and CuSe have been deposited in the temperature range 450–500 °C. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Materials Science: Materials in Electronics Springer Journals

The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

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References (8)

Publisher
Springer Journals
Copyright
Copyright © 2002 by Kluwer Academic Publishers
Subject
Materials Science; Optical and Electronic Materials; Characterization and Evaluation of Materials
ISSN
0957-4522
eISSN
1573-482X
DOI
10.1023/A:1019665428255
Publisher site
See Article on Publisher Site

Abstract

Highly oriented crystalline films of copper sulfide and copper selenide have been grown on glass by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) and by aerosol-assisted chemical vapor deposition (AACVD), using the novel air-stable compounds Cu(E2CNMenHex)2]* (where E=S,Se). Thin films of non-stoichiometric cubic CuS and CuSe have been deposited in the temperature range 450–500 °C.

Journal

Journal of Materials Science: Materials in ElectronicsSpringer Journals

Published: Oct 12, 2004

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