Contents Contents Contents Front Cover: Chloride regulates the sterilization eﬀ ect by plasma depending on the working gas. It potentiates O plasma-induced, but attenuates N and air plasma-induced bacterial inactivation (top-panel ﬁ gures). The potentiation eﬀ ect was attributed to the generation of HOCl and the increase of reactive oxygen species (ROS) levels. The attenuation eﬀ ect was due to the reaction of gen- erated HOCl with NO - and H O , which decreased the reactive 2 2 2 oxygen and nitrogen species (RONS) levels. Further details can be found in the article by Zhigang Ke, Zhu Chen and Qing Huang (e1700153). Communications Vacuum Ultraviolet (VUV) absorption and Photoabsorption and Damage of OSG damage of nanoporous organosilicate glass Low-k Films by VUV Emission at (OSG) low-k dielectrics in the wavelength 140–160 nm range 140–160 nm is studied. VUV damage of OSG dielectrics very slowly decreases with in- D. V. Lopaev, V. V. Rakhlinsky, creasing wavelength compared to SiO2 which S. M. Zyryanov, Y. A. Mankelevich, absorption sharply drops reaching the absorp- T. V. Rakhimova, K. A. Kurchikov, tion edge. The possible absorption and damage M. R. Baklanov mechanisms are brieﬂ y discussed. Plasma Process. Polym. 2018, 15, 1700166
Plasma Processes and Polymers – Wiley
Published: Jan 1, 2018
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