ZnO Films Deposited by Electron-Beam Evaporation: The Effect of Ion Bombardment

ZnO Films Deposited by Electron-Beam Evaporation: The Effect of Ion Bombardment The deposition of ZnO films on different substrates by electron-beam evaporation is studied experimentally. The substrate is essentially held at a negative bias voltage during the process. The dependence of the lattice structure and photoluminescence spectra of the films on the type of substrate and the bias is investigated. It is shown that the incident ion stream resulting from the negative bias allows one to produce films at a lower substrate temperature. The bias that provides epitaxial growth is found to lie between –400 and –200 V. It is determined that the films deposited on (0001)-oriented sapphire have a carrier concentration of 7.5 × 1018 cm–3 and a Hall mobility of 18.4 cm2/(V s). http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

ZnO Films Deposited by Electron-Beam Evaporation: The Effect of Ion Bombardment

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Kluwer Academic Publishers-Plenum Publishers
Copyright © 2002 by MAIK "Nauka/Interperiodica"
Engineering; Electrical Engineering
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