The resolution of focused-ion-beam (FIB) microscopes, whether analytical or processing ones, is known to be determined by three main factors: (i) the size of a Gaussian (ideal) image of the ion source, (ii) the ion-optical aberrations, and (iii) the scattering of primary ions and secondary particles (both ions and electrons) in the target. This paper shows that each of them can be significantly reduced owing to recent advances in the field. These are (i) innovative field-ionization ion sources with a sub-1-nm effective emission area and improved brightness and ion-energy spread, (ii) the concept of a combined electromagnetic mirror for correcting axial aberrations in ion optics, and (iii) fresh data on the collision of low-energy He+ ions with a pure-metal surface and on the deceleration of low-energy O 2 + ions in diamond. On this basis, a new concept of FIB microscope is proposed and discussed that is capable of operating in both analytical and processing mode, and offers better resolution by reducing all of the above-mentioned factors. It is shown that the combined electromagnetic mirror proposed enables one to achieve a 1.6-and a 1.5-nm resolution in analytical and processing mode, respectively, when only chromatic aberration is corrected. With perfect axial-aberration correction, a 0.6-and a 1-nm resolution should be attainable in analytical and processing mode, respectively.
Russian Microelectronics – Springer Journals
Published: Sep 27, 2007
It’s your single place to instantly
discover and read the research
that matters to you.
Enjoy affordable access to
over 18 million articles from more than
15,000 peer-reviewed journals.
All for just $49/month
Query the DeepDyve database, plus search all of PubMed and Google Scholar seamlessly
Save any article or search result from DeepDyve, PubMed, and Google Scholar... all in one place.
All the latest content is available, no embargo periods.
“Whoa! It’s like Spotify but for academic articles.”@Phil_Robichaud