Tungstic acid-assisted thermal oxidation of GaAs

Tungstic acid-assisted thermal oxidation of GaAs An experiment is conducted to investigate the influence of tungstic acid, H2WO4, on the growth mechanism of thermal-oxide thin films on GaAs. It is established that feeding H2WO4 into the reaction zone leads to incorporation of W into the oxide and formation of heteropoly compounds. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Tungstic acid-assisted thermal oxidation of GaAs

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Publisher
Nauka/Interperiodica
Copyright
Copyright © 2007 by Pleiades Publishing, Ltd.
Subject
Engineering; Electronic and Computer Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739707060030
Publisher site
See Article on Publisher Site

Abstract

An experiment is conducted to investigate the influence of tungstic acid, H2WO4, on the growth mechanism of thermal-oxide thin films on GaAs. It is established that feeding H2WO4 into the reaction zone leads to incorporation of W into the oxide and formation of heteropoly compounds.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 16, 2007

References

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