Thermally Induced Viscous Flow of Borophosphosilicate-Glass Thin Films on Stepped Surfaces, Part 1: A Review of Quantitative Studies on Furnace and Rapid Thermal Annealing

Thermally Induced Viscous Flow of Borophosphosilicate-Glass Thin Films on Stepped Surfaces, Part... The results are reviewed of studies on the thermally induced viscous flow of borophosphosilicate-glass thin films, which are used as premetal dielectrics in ICs of micrometer or submicrometer feature size. Part 1 is concerned with experiments on the furnace annealing and rapid thermal annealing of the films. A quantitative approach to the description of thermal glass flow is discussed. Factors affecting the accuracy of the formulas are considered. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Thermally Induced Viscous Flow of Borophosphosilicate-Glass Thin Films on Stepped Surfaces, Part 1: A Review of Quantitative Studies on Furnace and Rapid Thermal Annealing

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2003 by MAIK Nauka/Interperiodica
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1023916502417
Publisher site
See Article on Publisher Site

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