The results are reviewed of studies on the thermally induced viscous flow of borophosphosilicate-glass thin films, which are used as premetal dielectrics in ICs of micrometer or submicrometer feature size. Part 1 is concerned with experiments on the furnace annealing and rapid thermal annealing of the films. A quantitative approach to the description of thermal glass flow is discussed. Factors affecting the accuracy of the formulas are considered.
Russian Microelectronics – Springer Journals
Published: Oct 11, 2004
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