Thermal Oxidation of InP Promoted by the Formation of N2O

Thermal Oxidation of InP Promoted by the Formation of N2O The thermal-oxidation growth of dielectric films on InP substrates with NH4NO3 introduced into the oxidizing atmosphere is studied experimentally. Due to the simultaneous formation of N2O from NH4NO3, this type of thermal oxidation of InP is found to run faster than the oxidation involving the external supply of humid O2 or N2O. The films thus produced demonstrate adequate dielectric performance. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Thermal Oxidation of InP Promoted by the Formation of N2O

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2002 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1014333107585
Publisher site
See Article on Publisher Site

Abstract

The thermal-oxidation growth of dielectric films on InP substrates with NH4NO3 introduced into the oxidizing atmosphere is studied experimentally. Due to the simultaneous formation of N2O from NH4NO3, this type of thermal oxidation of InP is found to run faster than the oxidation involving the external supply of humid O2 or N2O. The films thus produced demonstrate adequate dielectric performance.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 13, 2004

References

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