Theoretical study of the thermal rearrangement of chloromethylsilanes, and its mechanism

Theoretical study of the thermal rearrangement of chloromethylsilanes, and its mechanism The thermal rearrangement reactions of chloromethylsilane, (chloromethyl)dimethylsilane, and (chloromethyl)vinylsilane have been studied by use of the density functional theory method at the B3LYP/6-311G(d, p) level. The structures of the reactants, transition states, and the products were determined and fully optimized. The geometries of the different stationary points and the harmonic vibrational frequencies were calculated at the same level. The results showed that thermal rearrangement of the chloromethylsilanes occurred via one pathway. The chlorine atom migrated from the carbon atom to the silicon atom, and the hydrogen atom migrated simultaneously from the silicon atom to the carbon atom through a double-three-membered-ring transition state, forming methylchlorosilane, trimethylchlorosilane, and vinylmethylchlorosilane. The energy barriers of the three rearrangements calculated at the B3LYP/6-311G(d, p) level were 217.4, 201.6, and 208.7 kJ mol−1, respectively. The effects of alkyl substituents on silicon atom are discussed. Changes of thermodynamic functions, equilibrium constant, and reaction rate constant were calculated in accordance with Eyring transition-state theory over the temperature range 400–1,500 K. Research on Chemical Intermediates Springer Journals

Theoretical study of the thermal rearrangement of chloromethylsilanes, and its mechanism

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Springer Netherlands
Copyright © 2012 by Springer Science+Business Media B.V.
Chemistry; Catalysis; Physical Chemistry; Inorganic Chemistry
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