The synthesis and properties of thin films based on double oxide system SiO2-ZrO2

The synthesis and properties of thin films based on double oxide system SiO2-ZrO2 The main physical and chemical processes involved in the preparation of SiO2-ZrO2 thin films from film-forming solutions based on zirconium oxochloride ZrOCl2·8H2O, tetraethoxysilane Si(C2H5O)4, and ethanol were studied. The phase composition, structure and physical and chemical properties of the films were determined and the diagram composition — property was constructed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Journal of Applied Chemistry Springer Journals

The synthesis and properties of thin films based on double oxide system SiO2-ZrO2

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Publisher
Springer US
Copyright
Copyright © 2013 by Pleiades Publishing, Ltd.
Subject
Chemistry; Chemistry/Food Science, general; Industrial Chemistry/Chemical Engineering
ISSN
1070-4272
eISSN
1608-3296
D.O.I.
10.1134/S1070427213070033
Publisher site
See Article on Publisher Site

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