Microsystem Technologies https://doi.org/10.1007/s00542-018-3973-4(0123456789().,-volV)(0123456789().,-volV) TECHNICAL PAPER The piezoresistance of a device with polyphenylenevinylene derivative PSS-PPV film 1 1 1 1 1 • • • • Jie Li Yu-xuan Hou Yu-yan Wang Fei Ye Gao-yu Zhong Received: 13 March 2018 / Accepted: 22 May 2018 Springer-Verlag GmbH Germany, part of Springer Nature 2018 The mechanical and electrical characteristics of poly[1-methoxy-4-(3-propyloxy-heptaisobutyl-PSS)-2,5-phenyleneviny- lene] (PSS-PPV) ﬁlm were studied in this work. The loading curves and Young’s modulus of PSS-PPV ﬁlm were measured with nanoindentation tests. The device ITO/PSS-PPV (75 nm)/Al (100 nm) was fabricated and measured to obtain the current–voltage (I–V) and current-time (I–T) curves under different pressures ranging in 0–163 kPa. The device demonstrated high sensitivity, good stability, and nice repeatability. The piezoresistance coefﬁcient can even reach -3 -1 2.0 9 10 Pa at 0.2 V and 111 kPa. The time and charges required to form a stable build-in electric ﬁeld in the device under different pressures were analyzed using a high-frequency square-wave voltage. It is deduced that the applied pressure not only tightens the PSS-PPV ﬁlm but also improves its conductance. This property makes PSS-PPV ﬁlm possess prospect in pressure sensing applications, though it still suffers from partly slow recovering after considerable
Microsystem Technologies – Springer Journals
Published: May 29, 2018
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