The influence of the sizes of the cross section of mesapiezoresistors on their characteristics

The influence of the sizes of the cross section of mesapiezoresistors on their characteristics The influence of the width of polysilicon mesapiezoresistors with dielectric insulation on their sheet resistance and piezosensitivity under the conditions of the formation of the passivation coating consisting of thermal silicon dioxide is investigated experimentally. A strong increase in the sheet resistance upon decreasing the width of mesapiezoresistors is found in the range 3 μm ≤ W ≤ 10 μm, which is associated with a decrease in the cross section and impurity segregation in the course of oxidation. The same effect is also observed for mesapiezoresistors fabricated based on SOI structures with a single-crystal silicon layer. It is established that a decrease in the width leads to an increase in the longitudinal piezosensitivity and a drop of the transverse piezosensitivity. The temperature coefficient of resistivity for the narrower boron-doped resistors weakly decreases for the selected concentration and remains constant for phosphorus-doped resistors. A simple model is suggested to interpret the behavior of the sheet resistance and piezosensitivity. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

The influence of the sizes of the cross section of mesapiezoresistors on their characteristics

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2011 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739711020041
Publisher site
See Article on Publisher Site

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