Electromigration in pure aluminum films evaporatively deposited with the method of partially ionized flux was studied by the drift-velocity technique. In annealed films, the energy of activation of electromi-gration was found to be almost half as large as in as-deposited ones. The film structure and texture, as well as the grain-boundary structure, were examined. The electromigration front morphology and activation energy variations were analyzed in the context of film structure.
Russian Microelectronics – Springer Journals
Published: Dec 4, 2007
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