The Effect of Thermal Annealing and Measurement Temperature on Interface State Density Distribution and Time Constant in Ni/n-GaP Rectifying Contacts

The Effect of Thermal Annealing and Measurement Temperature on Interface State Density... The capacitance–frequency (C–f) and conductance–frequency (G–f) characteristics of the as-deposited and 400°C annealed Ni/n-GaP/Al diode were measured in a temperature range of 100–320 K with steps of 20 K. The values of interface state density N ss and their time constant were obtained from the temperature-dependent C–f and G–f characteristics in the measurement frequency range of 5.0 kHz to 5 MHz. The effect of annealing and measurement temperature on N ss and time constant of a Ni/n-GaP Schottky diode were analyzed from the forward bias voltage to the reverse bias voltage − 0.60 with steps of 0.30 V. The N ss value ranges from 8.8 × 1011 cm−2eV−1 at 0.60 V to 5.71 × 1011 cm−2eV−1 at − 0.60 V for the as-deposited diode, and 1.3 × 1012 cm−2eV−1 at 0.60 V to 5.5 × 1011 cm−2eV−1 at − 0.60 V for the 400°C annealed diode at a measurement temperature of 300 K. The interface state density value increases with high measurement temperature for the as-deposited and annealed diode. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Electronic Materials Springer Journals

The Effect of Thermal Annealing and Measurement Temperature on Interface State Density Distribution and Time Constant in Ni/n-GaP Rectifying Contacts

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Publisher
Springer Journals
Copyright
Copyright © 2018 by The Minerals, Metals & Materials Society
Subject
Materials Science; Optical and Electronic Materials; Characterization and Evaluation of Materials; Electronics and Microelectronics, Instrumentation; Solid State Physics
ISSN
0361-5235
eISSN
1543-186X
D.O.I.
10.1007/s11664-018-6192-y
Publisher site
See Article on Publisher Site

Abstract

The capacitance–frequency (C–f) and conductance–frequency (G–f) characteristics of the as-deposited and 400°C annealed Ni/n-GaP/Al diode were measured in a temperature range of 100–320 K with steps of 20 K. The values of interface state density N ss and their time constant were obtained from the temperature-dependent C–f and G–f characteristics in the measurement frequency range of 5.0 kHz to 5 MHz. The effect of annealing and measurement temperature on N ss and time constant of a Ni/n-GaP Schottky diode were analyzed from the forward bias voltage to the reverse bias voltage − 0.60 with steps of 0.30 V. The N ss value ranges from 8.8 × 1011 cm−2eV−1 at 0.60 V to 5.71 × 1011 cm−2eV−1 at − 0.60 V for the as-deposited diode, and 1.3 × 1012 cm−2eV−1 at 0.60 V to 5.5 × 1011 cm−2eV−1 at − 0.60 V for the 400°C annealed diode at a measurement temperature of 300 K. The interface state density value increases with high measurement temperature for the as-deposited and annealed diode.

Journal

Journal of Electronic MaterialsSpringer Journals

Published: Mar 8, 2018

References

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