The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during their deposition under a plasma-stimulated deposition

The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during... The effect of electromagnetic fields and a current flowing across the films during the growth process on their crystalline structure and electrical, magnetic, and galvanomagnetic properties is investigated. Under the optimal parameters of the deposition process, polycrystalline, magnetic, and conducting films of permalloy at least 1.7 nm thick are obtained. Two critical thicknesses of the films are established, at which the scattering mechanisms of the conduction electrons vary. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during their deposition under a plasma-stimulated deposition

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2009 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739709030032
Publisher site
See Article on Publisher Site

Abstract

The effect of electromagnetic fields and a current flowing across the films during the growth process on their crystalline structure and electrical, magnetic, and galvanomagnetic properties is investigated. Under the optimal parameters of the deposition process, polycrystalline, magnetic, and conducting films of permalloy at least 1.7 nm thick are obtained. Two critical thicknesses of the films are established, at which the scattering mechanisms of the conduction electrons vary.

Journal

Russian MicroelectronicsSpringer Journals

Published: May 17, 2009

References

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