Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist

Synthesis of novel copolymer based on precipitation polymerization and its application in... A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence of sodium methoxide in methanol. The fourier transfer infrared (FT-IR) spectra and proton nuclear magnetic resonance (1H–NMR) spectra indicated that the synthesis was successful. The molecular weight, glass transition temperature (Tg) and thermal decomposition temperature (T(10%)) of the copolymers increased with the addition of CA. Moreover, a positive-tone chemically amplified Krypton Fluoride (KrF) photoresist was prepared, and the photolithography performance of the photoresist was evaluated using a KrF laser exposure system, the result showed that the resolution could reach the level of 0.25 μm. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Polymer Research Springer Journals

Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist

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Publisher
Springer Netherlands
Copyright
Copyright © 2017 by Springer Science+Business Media B.V.
Subject
Chemistry; Polymer Sciences; Industrial Chemistry/Chemical Engineering; Characterization and Evaluation of Materials
ISSN
1022-9760
eISSN
1572-8935
D.O.I.
10.1007/s10965-017-1370-9
Publisher site
See Article on Publisher Site

Abstract

A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence of sodium methoxide in methanol. The fourier transfer infrared (FT-IR) spectra and proton nuclear magnetic resonance (1H–NMR) spectra indicated that the synthesis was successful. The molecular weight, glass transition temperature (Tg) and thermal decomposition temperature (T(10%)) of the copolymers increased with the addition of CA. Moreover, a positive-tone chemically amplified Krypton Fluoride (KrF) photoresist was prepared, and the photolithography performance of the photoresist was evaluated using a KrF laser exposure system, the result showed that the resolution could reach the level of 0.25 μm.

Journal

Journal of Polymer ResearchSpringer Journals

Published: Oct 30, 2017

References

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