Synthesis and use of anodic borosilicate diffusion sources

Synthesis and use of anodic borosilicate diffusion sources The synthesis of borosilicate coatings on n-type silicon by anodic oxidation in an ethylene glycol solution containing boric acid is studied experimentally in terms of the dependence of coating thickness and resistivity on oxidation regime and boric acid concentration. The effect of annealing at 400–600°C is investigated. On this basis, a fabrication process of anodic borosilicate diffusion sources is proposed for micro-and nanoelectronics manufacturing. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Synthesis and use of anodic borosilicate diffusion sources

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2008 by MAIK Nauka
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S106373970805003X
Publisher site
See Article on Publisher Site

Abstract

The synthesis of borosilicate coatings on n-type silicon by anodic oxidation in an ethylene glycol solution containing boric acid is studied experimentally in terms of the dependence of coating thickness and resistivity on oxidation regime and boric acid concentration. The effect of annealing at 400–600°C is investigated. On this basis, a fabrication process of anodic borosilicate diffusion sources is proposed for micro-and nanoelectronics manufacturing.

Journal

Russian MicroelectronicsSpringer Journals

Published: Sep 21, 2008

References

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