Studying the mechanism of the interaction between silicon nitride, oxygen, and nitrogen in heating and the processes of defect formation in Si3N4 — gas systems

Studying the mechanism of the interaction between silicon nitride, oxygen, and nitrogen in... The method of precision thermal massometry is used to study the interaction between silicon nitride, oxygen, and nitrogen in nonisothermal heating at 300 -1300 K and a partial gas pressure of 19,998.3 Pa (150 Torr). The behavior of Si3N4 heated in forevacuum is studied. A special computer analysis of the experimentally obtained dependencies has provided kinetic equations for analyzing and determining the mechanisms of these processes and computing their activation energy. The experimental data are used for creating a hypothesis that the nitrogen sublattice of Si3N4 is dispersed before the beginning of its interaction with oxygen and nitrogen. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Refractories and Industrial Ceramics Springer Journals

Studying the mechanism of the interaction between silicon nitride, oxygen, and nitrogen in heating and the processes of defect formation in Si3N4 — gas systems

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Publisher
Springer US
Copyright
Copyright © 1999 by Kluwer Academic/Plenum Publishers
Subject
Chemistry; Characterization and Evaluation of Materials; Materials Science; Ceramics, Glass, Composites, Natural Methods
ISSN
1083-4877
eISSN
1573-9139
D.O.I.
10.1007/BF02770591
Publisher site
See Article on Publisher Site

Abstract

The method of precision thermal massometry is used to study the interaction between silicon nitride, oxygen, and nitrogen in nonisothermal heating at 300 -1300 K and a partial gas pressure of 19,998.3 Pa (150 Torr). The behavior of Si3N4 heated in forevacuum is studied. A special computer analysis of the experimentally obtained dependencies has provided kinetic equations for analyzing and determining the mechanisms of these processes and computing their activation energy. The experimental data are used for creating a hypothesis that the nitrogen sublattice of Si3N4 is dispersed before the beginning of its interaction with oxygen and nitrogen.

Journal

Refractories and Industrial CeramicsSpringer Journals

Published: Nov 29, 2007

References

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