Study on quasi-orthogonal machining of elastomer pad by single-point diamond tool

Study on quasi-orthogonal machining of elastomer pad by single-point diamond tool Chemical mechanical polishing (CMP) process has been a popular wafer and thin film planarization process for semiconductor fabrication. In CMP process, a diamond dresser with well-distributed diamond grits is usually applied for regenerating the pad surface topography to maintain the pad polishing capability. This paper describes the fundamentally quasi-orthogonal diamond dressing process by pyramid single-point diamond tools at different grit angles under the fixed down pressure and slow dressing speed for elastomer pad conditioning. Experiments of single-point diamond dressing by both face direction dressing (FDD) and edge direction dressing (EDD) have been performed to investigate the normal force profile and pad surface topography. Experimental results show that FDD generates a higher quality of pad surface with lesser plowing volume and relatively stable pad cutting rate (PCR). Moreover, diamond grit with grit angle of 90° has been found to be most suitable while shifting between EDD and FDD during actual diamond dressing process. Results of this study can be applied to diamond dresserv design and optimization of the pad surface topography uniformity in diamond dressing process for CMP of integrated circuit (IC) production. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png The International Journal of Advanced Manufacturing Technology Springer Journals

Study on quasi-orthogonal machining of elastomer pad by single-point diamond tool

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Publisher
Springer London
Copyright
Copyright © 2017 by Springer-Verlag London Ltd.
Subject
Engineering; Industrial and Production Engineering; Media Management; Mechanical Engineering; Computer-Aided Engineering (CAD, CAE) and Design
ISSN
0268-3768
eISSN
1433-3015
D.O.I.
10.1007/s00170-017-1206-0
Publisher site
See Article on Publisher Site

Abstract

Chemical mechanical polishing (CMP) process has been a popular wafer and thin film planarization process for semiconductor fabrication. In CMP process, a diamond dresser with well-distributed diamond grits is usually applied for regenerating the pad surface topography to maintain the pad polishing capability. This paper describes the fundamentally quasi-orthogonal diamond dressing process by pyramid single-point diamond tools at different grit angles under the fixed down pressure and slow dressing speed for elastomer pad conditioning. Experiments of single-point diamond dressing by both face direction dressing (FDD) and edge direction dressing (EDD) have been performed to investigate the normal force profile and pad surface topography. Experimental results show that FDD generates a higher quality of pad surface with lesser plowing volume and relatively stable pad cutting rate (PCR). Moreover, diamond grit with grit angle of 90° has been found to be most suitable while shifting between EDD and FDD during actual diamond dressing process. Results of this study can be applied to diamond dresserv design and optimization of the pad surface topography uniformity in diamond dressing process for CMP of integrated circuit (IC) production.

Journal

The International Journal of Advanced Manufacturing TechnologySpringer Journals

Published: Nov 25, 2017

References

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