Study of heterostructures according to single-crystal X-ray diffractometry

Study of heterostructures according to single-crystal X-ray diffractometry Opportunities of the use of an XMD-300 diffractometer in three mapping schemes have been considered, namely, grazing primary beam, grazing diffracted beam, and the θ-2θ scheme, for the study of crystal perfection of semiconductor heterostructures (silicon-on-sapphire, silicon-on-insulator, ion-doped silica layers, and AlGaN/GaN/Si structures). It has been shown that the measurements with the use of three schemes in scattered radiation and in the exact performance of Bragg diffraction condition enable one to obtain a fringe pattern of diffraction simultaneously from crystal lattices of several layers of the heterostructure and interference peaks of maximum intensity for each individual layer. Russian Microelectronics Springer Journals

Study of heterostructures according to single-crystal X-ray diffractometry

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Springer US
Copyright © 2013 by Pleiades Publishing, Ltd.
Engineering; Electrical Engineering
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