Statistical Simulation for Process Design and Optimization in IC Manufacture

Statistical Simulation for Process Design and Optimization in IC Manufacture An approach to multidimensional statistical simulation for process design and optimization in IC manufacture is proposed. It essentially takes account of the sensitivity of circuit parameters to the random variability of process parameters. The approach is implemented in an algorithm and software for process statistical analysis and optimization. The response-surface methodology and pattern-recognition techniques are used for the approximation of relations between process and circuit parameters. The capabilities of the approach are evaluated from simulated and measured data on the fabrication of transistors by routine bipolar and CMOS technologies. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Statistical Simulation for Process Design and Optimization in IC Manufacture

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2003 by MAIK Nauka/Interperiodica
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1021861819656
Publisher site
See Article on Publisher Site

References

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