Stabilization of Structure–Impurity and Electrophysical Parameters in the Si/SiO2 System

Stabilization of Structure–Impurity and Electrophysical Parameters in the Si/SiO2 System It is shown that structure–impurity and electrophysical parameters of the Si/SiO2 system can be stabilized by annealing the system in a halogen-containing atmosphere after thermal oxidation of Si. The underlying physicochemical ideas are represented in the form of a general (application-independent) mathematical model. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Stabilization of Structure–Impurity and Electrophysical Parameters in the Si/SiO2 System

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2000 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1026692103275
Publisher site
See Article on Publisher Site

Abstract

It is shown that structure–impurity and electrophysical parameters of the Si/SiO2 system can be stabilized by annealing the system in a halogen-containing atmosphere after thermal oxidation of Si. The underlying physicochemical ideas are represented in the form of a general (application-independent) mathematical model.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 8, 2004

References

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