Specific features of the bulk etching of single-crystal semiconducting silicon in aqueous KOH solutions

Specific features of the bulk etching of single-crystal semiconducting silicon in aqueous KOH... Bulk chemical etching of single-crystal semiconducting silicon in aqueous alkaline solutions of KOH was studied at various solution temperatures, alkaline component concentrations, and microscopic amounts of a potassium ferricyanide additive. Specific effects of these factors on the process of silicon etching are explained by comparing the corresponding activation energies. The possibility of using alkaline aqueous solutions of KOH with a potassium ferricyanide additive for fabrication of elements in microsystem technology devices is assessed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Journal of Applied Chemistry Springer Journals

Specific features of the bulk etching of single-crystal semiconducting silicon in aqueous KOH solutions

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2010 by Pleiades Publishing, Ltd.
Subject
Chemistry; Industrial Chemistry/Chemical Engineering; Chemistry/Food Science, general
ISSN
1070-4272
eISSN
1608-3296
D.O.I.
10.1134/S1070427210060091
Publisher site
See Article on Publisher Site

Abstract

Bulk chemical etching of single-crystal semiconducting silicon in aqueous alkaline solutions of KOH was studied at various solution temperatures, alkaline component concentrations, and microscopic amounts of a potassium ferricyanide additive. Specific effects of these factors on the process of silicon etching are explained by comparing the corresponding activation energies. The possibility of using alkaline aqueous solutions of KOH with a potassium ferricyanide additive for fabrication of elements in microsystem technology devices is assessed.

Journal

Russian Journal of Applied ChemistrySpringer Journals

Published: Jul 24, 2010

References

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