Simulation of implant distribution with the inverse Fokker-Planck equation

Simulation of implant distribution with the inverse Fokker-Planck equation A new mathematical model for the calculation of the implant distribution function in a solid is suggested. The case when low-transferred-energy ion collisions prevail is considered. The model exploits the reverse Fokker-Planck equation, which is derived from the Boltzmann transfer equation by approximating the collision integral with a differential operator. Algorithms for numerically solving the boundary-value problem for the Fokker-Planck equation are implemented. Obtained results are compared with the Monte-Carlo simulation of the implant concentration distribution for the case of high-energy boron implantation into silicon. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Simulation of implant distribution with the inverse Fokker-Planck equation

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Publisher
Nauka/Interperiodica
Copyright
Copyright © 2000 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electronic and Computer Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1007/BF02773262
Publisher site
See Article on Publisher Site

Abstract

A new mathematical model for the calculation of the implant distribution function in a solid is suggested. The case when low-transferred-energy ion collisions prevail is considered. The model exploits the reverse Fokker-Planck equation, which is derived from the Boltzmann transfer equation by approximating the collision integral with a differential operator. Algorithms for numerically solving the boundary-value problem for the Fokker-Planck equation are implemented. Obtained results are compared with the Monte-Carlo simulation of the implant concentration distribution for the case of high-energy boron implantation into silicon.

Journal

Russian MicroelectronicsSpringer Journals

Published: Dec 4, 2007

References

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