Simulating the deposition and synthesis of amorphous hydrogenated carbon films

Simulating the deposition and synthesis of amorphous hydrogenated carbon films The effect of synthesis conditions on the deposition of amorphous hydrogenated carbon (a-C:H) is estimated. Based on the expressions obtained in the simulation, the effect of partial hydrogen pressures and rf-radiation power on the deposition rate, composition, and structure of the a-C:H films is explained. The model of nucleation and growth of amorphous and crystalline diamondlike materials is developed [1, 2]. The model is expected to simplify the search for optimal regimes for synthesizing the materials with the specified composition, structure, and properties. Russian Microelectronics Springer Journals

Simulating the deposition and synthesis of amorphous hydrogenated carbon films

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Springer US
Copyright © 2013 by Pleiades Publishing, Ltd.
Engineering; Electrical Engineering
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