The electromagnetic interaction is considered between a conducting wafer and a gas-discharge plasma under both dc and ac conditions, with emphasis on the collection of discharge current by the wafer. The mechanism is described whereby a silicon wafer behaves like an asymmetrical short-circuited double Langmuir probe. This model provides an understanding of how plasmas act on conducting parts of fabrication equipment.
Russian Microelectronics – Springer Journals
Published: Feb 19, 2005
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