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Self-aligned SHF structures with direct and inverted ultrathin emitter regions

Self-aligned SHF structures with direct and inverted ultrathin emitter regions The optimization of the construction and technology of bipolar self-aligned SHF transistor structures with direct and inverted ultrathin emitter regions is carried out. The threshold amplification frequency and maximum oscillation frequency, which are 500 GHz, are shown to be reachable when using self-adjoined pseudo-lithographic masks and decreasing parasitic capacities and resistances. Methods for creating direct and inverted extremely narrow emitter regions doped with arsenic are proposed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Self-aligned SHF structures with direct and inverted ultrathin emitter regions

Russian Microelectronics , Volume 43 (7) – Nov 14, 2014

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References (18)

Publisher
Springer Journals
Copyright
Copyright © 2014 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
DOI
10.1134/S1063739714070166
Publisher site
See Article on Publisher Site

Abstract

The optimization of the construction and technology of bipolar self-aligned SHF transistor structures with direct and inverted ultrathin emitter regions is carried out. The threshold amplification frequency and maximum oscillation frequency, which are 500 GHz, are shown to be reachable when using self-adjoined pseudo-lithographic masks and decreasing parasitic capacities and resistances. Methods for creating direct and inverted extremely narrow emitter regions doped with arsenic are proposed.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 14, 2014

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