Selective Anodizing for Making Multilevel Interconnections

Selective Anodizing for Making Multilevel Interconnections The patterning of Al films on insulator substrates by selective electrolytic anodizing is studied experimentally. For the process and the masks, conditions are identified under which pattern transfer is accurate to within 10–15%. These show an improvement on most lithographic technologies. Conducting paths with an almost rectangular profile, an impedance of 50 ± 5 Ω, and a 95% degree of planarization are produced. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Selective Anodizing for Making Multilevel Interconnections

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Publisher
Springer Journals
Copyright
Copyright © 2003 by MAIK Nauka/Interperiodica
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1023957619256
Publisher site
See Article on Publisher Site

Abstract

The patterning of Al films on insulator substrates by selective electrolytic anodizing is studied experimentally. For the process and the masks, conditions are identified under which pattern transfer is accurate to within 10–15%. These show an improvement on most lithographic technologies. Conducting paths with an almost rectangular profile, an impedance of 50 ± 5 Ω, and a 95% degree of planarization are produced.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 11, 2004

References

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