The patterning of Al films on insulator substrates by selective electrolytic anodizing is studied experimentally. For the process and the masks, conditions are identified under which pattern transfer is accurate to within 10–15%. These show an improvement on most lithographic technologies. Conducting paths with an almost rectangular profile, an impedance of 50 ± 5 Ω, and a 95% degree of planarization are produced.
Russian Microelectronics – Springer Journals
Published: Oct 11, 2004
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