The patterning of Al films on insulator substrates by selective electrolytic anodizing is studied experimentally. For the process and the masks, conditions are identified under which pattern transfer is accurate to within 10–15%. These show an improvement on most lithographic technologies. Conducting paths with an almost rectangular profile, an impedance of 50 ± 5 Ω, and a 95% degree of planarization are produced.
Russian Microelectronics – Springer Journals
Published: Oct 11, 2004
It’s your single place to instantly
discover and read the research
that matters to you.
Enjoy affordable access to
over 18 million articles from more than
15,000 peer-reviewed journals.
All for just $49/month
Query the DeepDyve database, plus search all of PubMed and Google Scholar seamlessly
Save any article or search result from DeepDyve, PubMed, and Google Scholar... all in one place.
All the latest content is available, no embargo periods.
“Whoa! It’s like Spotify but for academic articles.”@Phil_Robichaud