Low-temperature plasma-chemical synthesis of silicon dioxide nanoparticles from tetraethoxysilane, performed at atmospheric pressure in a reactor with flat perforated electrodes coated with an insulating layer, was studied. The use of such electrodes allows reaching stable sustaining of RF discharge (α-mode) with helium and argon used as plasma-forming gases. The relationships of the synthesis of silicon dioxide nanoparticles from tetraethoxysilane in helium and argon plasma differ insignificantly. Most probably, nanoparticles with the size in the interval 100–150 nm are formed in the zone of the discharge sustaining, but, as the particles are transported with the gas flow beyond the plasma zone, they undergo agglomeration. An increase in the nanoparticle size to 100–150 nm, observed when using perforated electrodes with an insulating coating, is most probably due to an increase in the residence time of the reaction gas medium in the zone of the discharge sustaining.
Russian Journal of Applied Chemistry – Springer Journals
Published: Feb 17, 2016
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