Radical copolymerization of p-(2,2-dichlorocyclopropyl)styrene with glycidyl methacrylate and properties of the polymer obtained

Radical copolymerization of p-(2,2-dichlorocyclopropyl)styrene with glycidyl methacrylate and... Copolymer of p-(2,2-dichlorocyclopropyl)styrene with glycidyl methacrylate was prepared by radical copolymerization of the monomers. The copolymerization constants and Alfrey–Price Q–e parameters were calculated. The photosensitivity of materials based on the synthesized copolymer was evaluated. Photochemical cross-linking of the copolymer containing photosensitive groups ([InlineMediaObject not available: see fulltext.], ∇) in the macromolecule was studied. The copolymer exhibits relatively high photosensitivity (54 cm2 J–1) and can be used for preparing negative resists. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Journal of Applied Chemistry Springer Journals

Radical copolymerization of p-(2,2-dichlorocyclopropyl)styrene with glycidyl methacrylate and properties of the polymer obtained

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Publisher
Pleiades Publishing
Copyright
Copyright © 2015 by Pleiades Publishing, Ltd.
Subject
Chemistry; Chemistry/Food Science, general; Industrial Chemistry/Chemical Engineering
ISSN
1070-4272
eISSN
1608-3296
D.O.I.
10.1134/S1070427215060245
Publisher site
See Article on Publisher Site

Abstract

Copolymer of p-(2,2-dichlorocyclopropyl)styrene with glycidyl methacrylate was prepared by radical copolymerization of the monomers. The copolymerization constants and Alfrey–Price Q–e parameters were calculated. The photosensitivity of materials based on the synthesized copolymer was evaluated. Photochemical cross-linking of the copolymer containing photosensitive groups ([InlineMediaObject not available: see fulltext.], ∇) in the macromolecule was studied. The copolymer exhibits relatively high photosensitivity (54 cm2 J–1) and can be used for preparing negative resists.

Journal

Russian Journal of Applied ChemistrySpringer Journals

Published: Sep 30, 2015

References

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