Copolymer of p-(2,2-dichlorocyclopropyl)styrene with glycidyl methacrylate was prepared by radical copolymerization of the monomers. The copolymerization constants and Alfrey–Price Q–e parameters were calculated. The photosensitivity of materials based on the synthesized copolymer was evaluated. Photochemical cross-linking of the copolymer containing photosensitive groups ([InlineMediaObject not available: see fulltext.], ∇) in the macromolecule was studied. The copolymer exhibits relatively high photosensitivity (54 cm2 J–1) and can be used for preparing negative resists.
Russian Journal of Applied Chemistry – Springer Journals
Published: Sep 30, 2015
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