Quantum lithography: status of the field

Quantum lithography: status of the field This contribution provides an analysis of progress in the field of quantum lithography. We review the conceptual foundations of this idea and the status of research aimed at implementing this idea in the laboratory. The selection of a highly sensitive recording material that functions by means of multiphoton absorption seems crucial to the success of the proposal of quantum lithography. This review thus devotes considerable attention to these materials considerations. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Quantum Information Processing Springer Journals

Quantum lithography: status of the field

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Publisher
Springer Journals
Copyright
Copyright © 2011 by Springer Science+Business Media, LLC
Subject
Physics; Mathematical Physics; Quantum Computing; Quantum Information Technology, Spintronics; Data Structures, Cryptology and Information Theory; Quantum Physics
ISSN
1570-0755
eISSN
1573-1332
D.O.I.
10.1007/s11128-011-0253-y
Publisher site
See Article on Publisher Site

Abstract

This contribution provides an analysis of progress in the field of quantum lithography. We review the conceptual foundations of this idea and the status of research aimed at implementing this idea in the laboratory. The selection of a highly sensitive recording material that functions by means of multiphoton absorption seems crucial to the success of the proposal of quantum lithography. This review thus devotes considerable attention to these materials considerations.

Journal

Quantum Information ProcessingSpringer Journals

Published: Jun 16, 2011

References

  • Quantum lithography with classical light
    Hemmer, R.P.; Muthukrishnan, A.; Scully, M.O.; Zubairy, M.S.
  • Fabrication of three-dimensional photonic crystal structures containing an active nonlinear optical chromophore
    Farsari, M.; Ovsianikov, A.; Vamvakaki, M.; Sakellari, I.; Gray, D.; Chichkov, B.N.; Fotakis, C.
  • Multiphoton absorbing materials: molecular designs, characterizations, and applications
    He, G.S.; Tan, L-S.; Zheng, Q.; Prasad, P.N.
  • Effect of the concentration of organic dyes on their surface plasmon enhanced two-photon absorption cross section using activated Au nanoparticles
    Cohanoschi, I.; Yao, S.; Belfield, K.D.; Hernández, F.E.
  • Observation of a microscopic cascaded contribution to the fifth-order nonlinear susceptibility
    Dolgaleva, K.; Shin, H.; Boyd, R.W.

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