It is shown that MBE-grown Si/CaF2/Si heterostructures are promising for SOI technology. On the basis of these heterostructures, test MIS/SOI structures were created. The mean electron mobility in the top silicon layer was found to be 450–600 cm2/ (V s). A test CMOS IC with a CoSi2gate and a CaF2gate dielectric was produced. The room-temperature ultimate speed of this structure was estimated (and measured) at a level of 1.5–2 GHz for a supply voltage of 3.0 V.
Russian Microelectronics – Springer Journals
Published: Oct 10, 2004
It’s your single place to instantly
discover and read the research
that matters to you.
Enjoy affordable access to
over 18 million articles from more than
15,000 peer-reviewed journals.
All for just $49/month
Query the DeepDyve database, plus search all of PubMed and Google Scholar seamlessly
Save any article or search result from DeepDyve, PubMed, and Google Scholar... all in one place.
All the latest content is available, no embargo periods.
“Whoa! It’s like Spotify but for academic articles.”@Phil_Robichaud