Probe studies of plasma characteristics in the ICP reactor

Probe studies of plasma characteristics in the ICP reactor The ICP plasma chemical reactor is studied by using the probe plasma diagnostic methods. The plasma density in the wafer region was evaluated at different parameters of the process. The automatic bias potential on the surface of glass wafers of different thickness and uniformity of the ion current density distribution over the plate diameter are measured. The deep silicon etching mode with a high uniformity over the whole plate is determined. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Probe studies of plasma characteristics in the ICP reactor

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Publisher
Springer US
Copyright
Copyright © 2013 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739712070116
Publisher site
See Article on Publisher Site

Abstract

The ICP plasma chemical reactor is studied by using the probe plasma diagnostic methods. The plasma density in the wafer region was evaluated at different parameters of the process. The automatic bias potential on the surface of glass wafers of different thickness and uniformity of the ion current density distribution over the plate diameter are measured. The deep silicon etching mode with a high uniformity over the whole plate is determined.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 7, 2013

References

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