Preparation and characterization of nanostructured TiO2 thin film codoped with nitrogen and vanadium on glass surface by sol–gel dip-coating method

Preparation and characterization of nanostructured TiO2 thin film codoped with nitrogen and... To enhance hydrophilicity and photocatalytic activity, N-doped and N–V-codoped TiO2 films were coated on glass substrates by the sol–gel dip-coating method. The substrates were previously coated with SiO2 using the same method. The coated samples, after annealing at 450 °C for 30 min in air, were analyzed by an X-ray diffractometer, scanning electron microscope, Fourier transform infrared spectroscope, X-ray photoelectron spectroscope, and UV–visible spectroscope. The SiO2/N–V-codoped TiO2 photocatalyst showed a narrower band gap (2.93 eV) compared to the SiO2/N-doped. Degradation tests, methyl orange under UV light and stearic acid under visible light, were performed in order to evaluate photocatalytic activity. It was observed that the SiO2/N–V-codoped photocatalyst was significantly better than the SiO2/N-doped TiO2. The presence of V and N in the TiO2 lattice motivated isolated energy levels near the conduction and valence bands, respectively, resulting in a narrowing of the band gap. Moreover, both of the energy levels could act as traps for photoexcited holes and electrons, reducing the recombination rate of charges, thus improving the photocatalytic activity of SiO2/N–V-codoped TiO2. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Research on Chemical Intermediates Springer Journals

Preparation and characterization of nanostructured TiO2 thin film codoped with nitrogen and vanadium on glass surface by sol–gel dip-coating method

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Publisher
Springer Netherlands
Copyright
Copyright © 2014 by Springer Science+Business Media Dordrecht
Subject
Chemistry; Catalysis; Physical Chemistry; Inorganic Chemistry
ISSN
0922-6168
eISSN
1568-5675
D.O.I.
10.1007/s11164-014-1816-1
Publisher site
See Article on Publisher Site

Abstract

To enhance hydrophilicity and photocatalytic activity, N-doped and N–V-codoped TiO2 films were coated on glass substrates by the sol–gel dip-coating method. The substrates were previously coated with SiO2 using the same method. The coated samples, after annealing at 450 °C for 30 min in air, were analyzed by an X-ray diffractometer, scanning electron microscope, Fourier transform infrared spectroscope, X-ray photoelectron spectroscope, and UV–visible spectroscope. The SiO2/N–V-codoped TiO2 photocatalyst showed a narrower band gap (2.93 eV) compared to the SiO2/N-doped. Degradation tests, methyl orange under UV light and stearic acid under visible light, were performed in order to evaluate photocatalytic activity. It was observed that the SiO2/N–V-codoped photocatalyst was significantly better than the SiO2/N-doped TiO2. The presence of V and N in the TiO2 lattice motivated isolated energy levels near the conduction and valence bands, respectively, resulting in a narrowing of the band gap. Moreover, both of the energy levels could act as traps for photoexcited holes and electrons, reducing the recombination rate of charges, thus improving the photocatalytic activity of SiO2/N–V-codoped TiO2.

Journal

Research on Chemical IntermediatesSpringer Journals

Published: Oct 2, 2014

References

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