# Practical Aspects of Off-Axis Illumination in Optical Nanolithography

Practical Aspects of Off-Axis Illumination in Optical Nanolithography The practical aspects are analyzed of off-axis illumination in optical lithography below the Rayleigh resolution. For major light-source aperture configurations, fundamental lower limits are identified on the lithographic factor $$k_1 = \frac{{L \cdot NA}}{\lambda }$$ , where L is the mask linewidth,NA is the numerical aperture of the objective, and λ is the wavelength. A practical approach is discussed to the calculation of the attainable values of k 1 for different aperture configurations, allowing for the forbidden-pitch phenomenon. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

# Practical Aspects of Off-Axis Illumination in Optical Nanolithography

, Volume 33 (4) – Oct 18, 2004
11 pages

/lp/springer_journal/practical-aspects-of-off-axis-illumination-in-optical-nanolithography-q3eW8GDa2J
Publisher
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/B:RUMI.0000033826.53423.81
Publisher site
See Article on Publisher Site

### Abstract

The practical aspects are analyzed of off-axis illumination in optical lithography below the Rayleigh resolution. For major light-source aperture configurations, fundamental lower limits are identified on the lithographic factor $$k_1 = \frac{{L \cdot NA}}{\lambda }$$ , where L is the mask linewidth,NA is the numerical aperture of the objective, and λ is the wavelength. A practical approach is discussed to the calculation of the attainable values of k 1 for different aperture configurations, allowing for the forbidden-pitch phenomenon.

### Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 18, 2004

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