Photosensitivity and Physicochemical Properties of the Two-Layer Photoresist Based on Naphthoquinone Diazide and Cyclorubber

Photosensitivity and Physicochemical Properties of the Two-Layer Photoresist Based on... The possibility was examined of preparing a model of a two-layer photoresist based on a photo-sensitive layer of naphthoquinone diazide (FP-383), a planarizing layer of cyclorubber (FN-11), enhancing the photosensitivity and physicochemical resistance of FN-11 films after irradiation through thenaphthoquinone diazide layer and its removal by development in KOH. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Journal of Applied Chemistry Springer Journals

Photosensitivity and Physicochemical Properties of the Two-Layer Photoresist Based on Naphthoquinone Diazide and Cyclorubber

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2001 by MAIK “Nauka/Interperiodica”
Subject
Chemistry; Chemistry/Food Science, general
ISSN
1070-4272
eISSN
1608-3296
D.O.I.
10.1023/A:1013024313748
Publisher site
See Article on Publisher Site

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