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V. Sharma, S. Affrossman, R. Pethrick (1983)
Copolymer electron resists: poly(stryene-methyl methacrylate) copolymersPolymer, 24
A. Ali, K. Srinivasan (1997)
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D. Tsiourvas, C. Paleos, P. Dais (1989)
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Copolymers prepared from vinyl cyclopropyl ether and maleic anhydride were modified with allyl alcohol, and the products obtained were thermally cross-linked with styrene. Photoresists were prepared from these copolymers, and their photolithographic parameters were determined.
Russian Journal of Applied Chemistry – Springer Journals
Published: Jan 19, 2011
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