On the creation of ordered nuclei by ion bombardment for obtaining nanoscale si structures on the surface of CaF2 films

On the creation of ordered nuclei by ion bombardment for obtaining nanoscale si structures on the... The effect of preliminary low-energy (~1 keV) and low-dose (~1012–1014 cm–2) ion bombardment on the initial stages of growth of Si films on a CaF2/Si surface is investigated. Ordered nanocrystal phases (thickness less than 5–6 monolayers) and homogeneous epitaxial nanofilms (thickness more than 8–10 monolayers) of silicon are shown to be formed after annealing. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques Springer Journals

On the creation of ordered nuclei by ion bombardment for obtaining nanoscale si structures on the surface of CaF2 films

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Publisher
Pleiades Publishing
Copyright
Copyright © 2017 by Pleiades Publishing, Ltd.
Subject
Materials Science; Surfaces and Interfaces, Thin Films
ISSN
1027-4510
eISSN
1819-7094
D.O.I.
10.1134/S1027451017040139
Publisher site
See Article on Publisher Site

Abstract

The effect of preliminary low-energy (~1 keV) and low-dose (~1012–1014 cm–2) ion bombardment on the initial stages of growth of Si films on a CaF2/Si surface is investigated. Ordered nanocrystal phases (thickness less than 5–6 monolayers) and homogeneous epitaxial nanofilms (thickness more than 8–10 monolayers) of silicon are shown to be formed after annealing.

Journal

Journal of Surface Investigation. X-ray, Synchrotron and Neutron TechniquesSpringer Journals

Published: Aug 24, 2017

References

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