The nonlinearity of scanning on a scanning electron microscope (SEM) of nanorelief elements with known geometric profile shapes is estimated. The average pitch value of the relief test structure is measured, when the studied sample is shifted along the X-axis (scanning axis). As an index that characterizes the nonlinearity of the SEM scanning with the stated sample displacements, the relative mean-square deviation from the average pitch value of the test structure is selected. It is experimentally shown that, when the magnification is 20k, this value is 0.4%, which is in the tolerance error range.
Russian Microelectronics – Springer Journals
Published: Nov 6, 2012
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