Nondestructive contactless electron-beam diagnostics of microelectronic device structures

Nondestructive contactless electron-beam diagnostics of microelectronic device structures An electron-beam diagnostic complex based on a scanning electron microscope is described. The complex allows the nondestructive contactless studies of microelectronic device structures and architectures and the simultaneous determination of the distribution of electrically active elements; i.e., the complex makes it possible to examine defects. The parallel diagnostic tests are based on the method of contactless detection of local electron-beam-induced potentials and on reflection electron microtomography in a scanning electron microscope. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Nondestructive contactless electron-beam diagnostics of microelectronic device structures

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Publisher
Springer Journals
Copyright
Copyright © 2010 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739710050021
Publisher site
See Article on Publisher Site

Abstract

An electron-beam diagnostic complex based on a scanning electron microscope is described. The complex allows the nondestructive contactless studies of microelectronic device structures and architectures and the simultaneous determination of the distribution of electrically active elements; i.e., the complex makes it possible to examine defects. The parallel diagnostic tests are based on the method of contactless detection of local electron-beam-induced potentials and on reflection electron microtomography in a scanning electron microscope.

Journal

Russian MicroelectronicsSpringer Journals

Published: Sep 24, 2010

References

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