New trends in the development of the technology for the production of ultraviolet light-emitting diodes

New trends in the development of the technology for the production of ultraviolet light-emitting... Some results on the creation of ultraviolet light-emitting diodes based on GaN/AlGaN heterostructures grown on aluminum nitride (AlN) substrates using the method of chloride-hydride epitaxy are presented. The peak wavelengths lie within the range of 360–365 nm, the width of a spectral curve is 10–13 nm, and the output optical power of light-emitting diode chips is 50 mW at a current of 350 mA. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

New trends in the development of the technology for the production of ultraviolet light-emitting diodes

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Publisher
Springer US
Copyright
Copyright © 2013 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739713080039
Publisher site
See Article on Publisher Site

Abstract

Some results on the creation of ultraviolet light-emitting diodes based on GaN/AlGaN heterostructures grown on aluminum nitride (AlN) substrates using the method of chloride-hydride epitaxy are presented. The peak wavelengths lie within the range of 360–365 nm, the width of a spectral curve is 10–13 nm, and the output optical power of light-emitting diode chips is 50 mW at a current of 350 mA.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 14, 2013

References

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