Microwave Plasmatrons for Fabrication of High-Density Integrated Circuits

Microwave Plasmatrons for Fabrication of High-Density Integrated Circuits Interaction between a high-power microwave and a planar layer of a low-pressure magnetoactive plasma under electron cyclotron resonance (ECR) conditions was studied. Results of numerical simulation of the one-dimensional problem are presented. Two modes of wave–plasma interaction were found. The use of these modes and their associated microwave plasmatrons in fabricating high-density ICs is discussed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Microwave Plasmatrons for Fabrication of High-Density Integrated Circuits

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Publisher
Springer-Verlag
Copyright
Copyright © 2001 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1011310609186
Publisher site
See Article on Publisher Site

Abstract

Interaction between a high-power microwave and a planar layer of a low-pressure magnetoactive plasma under electron cyclotron resonance (ECR) conditions was studied. Results of numerical simulation of the one-dimensional problem are presented. Two modes of wave–plasma interaction were found. The use of these modes and their associated microwave plasmatrons in fabricating high-density ICs is discussed.

Journal

Russian MicroelectronicsSpringer Journals

Published: Aug 1, 2014

References

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