Methods of Multiplex Spectroscopy in the Characterization of Nanoscale Multilayers

Methods of Multiplex Spectroscopy in the Characterization of Nanoscale Multilayers The concept and mathematical framework are presented of a multiwavelength approach to optical reflectometry, including ellipsometry, in order to obtain a nondestructive tool for the analysis and depth profiling of ultrathin inhomogeneous films. It is noted that the multiwavelength approach allows one to employ ideas of multiplex spectroscopy and computerized tomography, the film being characterized by solving an integral equation of the first kind. Some applications of the approach are discussed, including measurement of complex-permittivity and chemical-composition profiles of oxide films on metal substrates. Russian Microelectronics Springer Journals

Methods of Multiplex Spectroscopy in the Characterization of Nanoscale Multilayers

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Kluwer Academic Publishers-Plenum Publishers
Copyright © 2004 by MAIK “Nauka/Interperiodica”
Engineering; Electrical Engineering
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