Mathematical simulation of the influence of a focusing channel surface on the angle characteristics of a bundle of rapid neutral particles

Mathematical simulation of the influence of a focusing channel surface on the angle... The model of the channel of the neutralization of the plasma source of bundles of rapid neutral particles (RNPs), which was developed earlier, is expanded for the case of rough surfaces forming the neutralization channel. With the help of mathematical modeling, the dependences of the main characteristics, as well as the spatial distribution of the RNP bundle from values of the roughness parameter, are obtained. It was found that the maximum values of the RNP bundle in the focusing plane when K > 30 practically stops depending on the values of roughness. These results may be used for the determination of the requirements for the purity of the processing surfaces of a source of RNP flows. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Mathematical simulation of the influence of a focusing channel surface on the angle characteristics of a bundle of rapid neutral particles

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2010 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739710060053
Publisher site
See Article on Publisher Site

Abstract

The model of the channel of the neutralization of the plasma source of bundles of rapid neutral particles (RNPs), which was developed earlier, is expanded for the case of rough surfaces forming the neutralization channel. With the help of mathematical modeling, the dependences of the main characteristics, as well as the spatial distribution of the RNP bundle from values of the roughness parameter, are obtained. It was found that the maximum values of the RNP bundle in the focusing plane when K > 30 practically stops depending on the values of roughness. These results may be used for the determination of the requirements for the purity of the processing surfaces of a source of RNP flows.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 11, 2010

References

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