The kinetics of the creation and annihilation of neutral particles in HCl and HBr plasmas under the conditions of standard industrial etching reactors is simulated. It is established that the two systems have similar kinetic schemes and exhibit only quantitative differences in plasma compositions. It is show that the HBr plasma is characterized by higher degrees of dissociation of the initial molecules and bromine atomic concentrations in the same temperature and electron concentration ranges.
Russian Microelectronics – Springer Journals
Published: Jul 14, 2016
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