Kinetic regularities of the chemical vapor deposition of nickel layers from bis-(ethylcyclopentadienyl)nickel

Kinetic regularities of the chemical vapor deposition of nickel layers from... Physicochemical regularities of the nickel layers chemical vapor deposition from bis-(ethylcyclopentadienyl)nickel were studied. Dependences of the growth rate of nickel layers on the deposition temperature, gas-flow linear rate, partial pressures of reagents, and substrate roughness, and also dependences of the thickness of a grown layer on time and on the position of a substrate on a susceptor were obtained. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Journal of Applied Chemistry Springer Journals

Kinetic regularities of the chemical vapor deposition of nickel layers from bis-(ethylcyclopentadienyl)nickel

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2012 by Pleiades Publishing, Ltd.
Subject
Chemistry; Industrial Chemistry/Chemical Engineering; Chemistry/Food Science, general
ISSN
1070-4272
eISSN
1608-3296
D.O.I.
10.1134/S1070427212050102
Publisher site
See Article on Publisher Site

Abstract

Physicochemical regularities of the nickel layers chemical vapor deposition from bis-(ethylcyclopentadienyl)nickel were studied. Dependences of the growth rate of nickel layers on the deposition temperature, gas-flow linear rate, partial pressures of reagents, and substrate roughness, and also dependences of the thickness of a grown layer on time and on the position of a substrate on a susceptor were obtained.

Journal

Russian Journal of Applied ChemistrySpringer Journals

Published: Jun 15, 2012

References

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