Physicochemical regularities of the nickel layers chemical vapor deposition from bis-(ethylcyclopentadienyl)nickel were studied. Dependences of the growth rate of nickel layers on the deposition temperature, gas-flow linear rate, partial pressures of reagents, and substrate roughness, and also dependences of the thickness of a grown layer on time and on the position of a substrate on a susceptor were obtained.
Russian Journal of Applied Chemistry – Springer Journals
Published: Jun 15, 2012
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