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IPL resistless lithography as a method for delta-doping of monocrystalline semiconductors by Al and Sb implantation

IPL resistless lithography as a method for delta-doping of monocrystalline semiconductors by Al... The potential is assessed of ion projection lithography (IPL) as a method for Al and Sb implantation delta-doping of silicon single crystals in order to produce prescribed arrangements of quantum dots and wires. Conceptually, the method uses an ion beam to project a stencil mask on a plane beneath the surface of a wafer, thus creating a desired doping profile. It is shown that IPL implanters with immersion electrostatic objectives could provide a lateral resolution of about 35 nm on a subfield area of 0.06 × 0.06 mm2. This resolution should allow one to produce 106 qubits on a chip area of 0.35 × 0.35 mm2. It also implies a throughput of 60 quantum chips per hour, which appears to be sufficient to produce quantum computers on a commercial basis. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

IPL resistless lithography as a method for delta-doping of monocrystalline semiconductors by Al and Sb implantation

Zhukov, V.
Russian Microelectronics , Volume 34 (2) – Mar 21, 2005
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References (10)

Publisher
Springer Journals
Copyright
Copyright © 2005 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
DOI
10.1007/s11180-005-0011-x
Publisher site
See Article on Publisher Site

Abstract

The potential is assessed of ion projection lithography (IPL) as a method for Al and Sb implantation delta-doping of silicon single crystals in order to produce prescribed arrangements of quantum dots and wires. Conceptually, the method uses an ion beam to project a stencil mask on a plane beneath the surface of a wafer, thus creating a desired doping profile. It is shown that IPL implanters with immersion electrostatic objectives could provide a lateral resolution of about 35 nm on a subfield area of 0.06 × 0.06 mm2. This resolution should allow one to produce 106 qubits on a chip area of 0.35 × 0.35 mm2. It also implies a throughput of 60 quantum chips per hour, which appears to be sufficient to produce quantum computers on a commercial basis.

Journal

Russian Microelectronics – Springer Journals

Published: Mar 21, 2005

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