An integrated computer-based measuring system is designed, assembled, and tested that combines ellipsometry with photovoltage measurements, using a semiconductor laser as the light source. It enables one to simultaneously measure the thickness and photovoltage-related properties of a micrometer-sized region selected in a thin surface layer. The system also gives computer-generated perspective images of the region examined. Both phase and intensity light modulation are provided by an electro-optical modulator operated over a wide frequency range. It is established that combining the two measurement techniques is a useful method for (i) detecting microscopic surface defects which cannot be revealed by purely optical methods and (ii) evaluating the semiconductor properties of thin surface layers.
Russian Microelectronics – Springer Journals
Published: Oct 11, 2004
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